Published June 1, 2004 | Version v1
Journal article

Structural and transport studies of stoichiometric and off-stoichiometric thin films of the full Heusler alloy Co2MnSi

  • 1. Blackett Laboratory, Imperial College, Prince Consort Road, London SW7 2AZ (United Kingdom)
  • 2. Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ (United Kingdom)

Description

Co2MnSi Heusler alloy thin films have been grown by cosputtering from three elemental targets. Changes in growth temperature and stoichiometry affect the film texture and the temperature dependence of the resistivity. However, the spin polarization of the transport current is insensitive to these changes, being of the order of 54% as determined by point contact Andreev reflection spectroscopy. Stoichiometric films are single phase, have a strong (110) texture, and a saturation magnetization of 1007 emu/cc (4.95 μB/formula unit) at 10 K

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
95
Journal Issue
11
Journal Page Range
p. 7231-7233
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2004 American Institute of Physics.