Published December 2004
| Version v1
Journal article
Comment on 'Low level plasma formation in a carbon velvet cesium iodide coated cathode' [Phys. Plasmas 11, 1680 (2004)]
Creators
- 1. Physics Department, Technion, 32000 Haifa (Israel)
- 2. Department of Physics, University of Strathclyde, John Anderson Building, 107 Rotten Row, Glasgow G4 0NG (United Kingdom)
Description
no abstract available
Additional details
Identifiers
- DOI
- 10.1063/1.1811617;
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 11
- Journal Issue
- 12
- Journal Page Range
- p. 5730-5731
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36084965
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- CARBON; CATHODES; CESIUM IODIDES; PLASMA; PLASMA PRODUCTION
- Descriptors DEC
- ALKALI METAL COMPOUNDS; CESIUM COMPOUNDS; ELECTRODES; ELEMENTS; HALIDES; HALOGEN COMPOUNDS; INORGANIC PHOSPHORS; IODIDES; IODINE COMPOUNDS; NONMETALS; PHOSPHORS
Optional Information
- Notes
- (c) 2004 American Institute of Physics