Published November 21, 2015 | Version v1
Journal article

Extended two-temperature model for ultrafast thermal response of band gap materials upon impulsive optical excitation

  • 1. Samsung Advanced Institute of Technology, Suwon 443-803 (Korea, Republic of)
  • 2. Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139-4307 (United States)
  • 3. Theoretical and Physical Chemistry Institute, National Hellenic Research Foundation, Athens 116-35 (Greece)

Description

Thermal modeling and numerical simulations have been performed to describe the ultrafast thermal response of band gap materials upon optical excitation. A model was established by extending the conventional two-temperature model that is adequate for metals, but not for semiconductors. It considers the time- and space-dependent density of electrons photoexcited to the conduction band and accordingly allows a more accurate description of the transient thermal equilibration between the hot electrons and lattice. Ultrafast thermal behaviors of bismuth, as a model system, were demonstrated using the extended two-temperature model with a view to elucidating the thermal effects of excitation laser pulse fluence, electron diffusivity, electron-hole recombination kinetics, and electron-phonon interactions, focusing on high-density excitation

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Chemical Physics
Journal Volume
143
Journal Issue
19
Journal Page Range
p. 194705-194705.7
ISSN
0021-9606
CODEN
JCPSA6

Optional Information

Notes
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