Published February 1, 2001
| Version v1
Report
Use of molecular oxygen to reduce EUV-induced carbon contamination of optics
Description
no abstract available
Availability note (English)
Available from www.als.lbl.govAdditional details
Publishing Information
- Imprint Pagination
- [vp.]
- Report number
- LBNL/ALS--13671
Conference
- Title
- SPIE Conference
- Dates
- 27 Feb - 2 Mar 2001
- Place
- Santa Clara, CA (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 33064569
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- CARBON; EXTREME ULTRAVIOLET RADIATION; OPTICS; OXYGEN; SURFACE TREATMENTS
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELEMENTS; NONMETALS; RADIATIONS; ULTRAVIOLET RADIATION
Optional Information
- Contract/Grant/Project number
- AC03-76SF00098
- Funding organization
- US Department of Energy (United States)