The route to visible light photolithography using hyperlens

Hyperlens, a curved hyperbolic metamaterials-based device, first emerged as a promising way of overcoming the diffraction limit for subwavelength imaging applications. In addition, it was recently realized that it can be used for sub-wavelength de-magnification. The magnification/de-magnification rate of the hyperlens is directly related to the thickness of the hyperbolic metamaterial. In this paper, we perform a systematic study on the de-magnification properties in different types of the hyperlens. We optimize the de-magnifying properties of a hyperlens to facilitate its potential applications for sub-wavelength photolithography. In order to achieve the required de-magnification properties, we developed a multi-step multi-layer deposition method to fabricate high-quality, thick hyperbolic metamaterials, advancing the state-of-the-art magnification and/or de-magnification properties of the hyperlens. The application of such a high de-magnification rate hyperlens in the photolithography technique may open up a new approach to the nanolithography using visible light, addressing growing demands for inexpensive, all-optical nanoscale pattern recording. (paper)