Published May 25, 2004 | Version v1
Journal article

Annealing behavior and solid-state reactions of Pd-Ge alloy thin films

Description

Solid-state reactions and amorphous Ge crystallization for various ratios of thickness (or composition) in Pd-Ge alloy thin films after annealing have been investigated by transmission electron microscopy. Besides polycrystalline Pd (p-Pd) and amorphous Ge (a-Ge), polycrystalline Pd2Ge (p-Pd2Ge) phase is also formed in as-evaporated films. During annealing at 250 deg. C, polycrystalline Pd2Ge and PdGe are formed. The experimental results indicate that the formation of Pd2Ge and PdGe compounds may be dominant at low annealing temperatures, and also affect amorphous Ge crystallization. The reactions are sensitively dependent on the annealing temperatures and the thickness ratio of Pd and Ge films. The reactions and amorphous Ge crystallization are mutually competitive in Pd-Ge alloy thin films

Additional details

Identifiers

DOI
10.1016/j.msea.2003.11.032;
PII
S0921509303014266;

Publishing Information

Journal Title
Materials Science and Engineering. A, Structural Materials: Properties, Microstructure and Processing
Journal Volume
373
Journal Issue
1-2
Journal Page Range
p. 21-25
ISSN
0921-5093
CODEN
MSAPE3

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.