Published December 19, 1969 | Version v1
Patent Restricted

Filament positioning method in electron irradiation

Description

The present invention relates to a filament positioning method in an electron irradiation apparatus. The conventional filament consists of a helical filament placed inside the hole in a Wehnelt electrode. But, accidents have often occured in which the filament and the Wehnelt electrode contacted each other. The purpose of the present invention is to provide a filament in which the position of the filament relative to the Wehnelt electrode can be varied externally to avoid the above-mentioned troubles. The present apparatus consists of a filament placed on one end of an insulator support, the other end of which is fixed to a plate made of a magnetic material. A magnet is provided outside the casement and it is used to fix the plate by the magnetic force external to the casement. The position of the filament can be varied by displacing the magnet along the surface plane of the casement. (Masui, R.)

Availability note (English)

MF available from INIS under the Report Number.

Files

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Additional details

Publishing Information

Imprint Pagination
3 p.
IPC:
Int. Cl. H01j1/15; H05h.
IPC
Int. Cl. H01j1/15; H05h.
Patent number
JP patent document 1973-19497/B/

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
7244890
Subject category
S43: PARTICLE ACCELERATORS;
Descriptors DEI
CONTROL EQUIPMENT; ELECTRON GUNS; FILAMENTS; IRRADIATION DEVICES; MAGNETIC MATERIALS; MAGNETS; MAINTENANCE; SUPPORTS
Descriptors DEC
MECHANICAL STRUCTURES