Published March 21, 2006 | Version v1
Journal article

In situ polymerization process of polypyrrole ultrathin films

  • 1. Department of Mechanical Engineering, Akashi National College of Technology, 679-3 Nishioka, Uozumi-cho, Akasi, Hyogo 674-8501 (Japan)
  • 2. Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, University of Hyogo, Himeji Shosha Campus, 2167 Shosha, Himeji, Hyogo 671-2201 (Japan)
  • 3. Kinden Corporation, 3-4 Honjo-Higashi, 2-Chome, Kita-ku, Osaka 531-8550 (Japan)

Description

A novel thin film processing technique has been developed for the fabrication of ultrathin films of conducting polymers with molecular-level control over thickness and multilayer architecture. This new self-assembly process opens up vast possibilities in applications which require large area, ultrathin films of conducting polymers and more importantly in applications that can take advantage of the unique interactions achievable in the complex, supermolecular architectures of multilayer films. In in situ polymerized polypyrrole (PPy), the deposition process strongly depends on the nature of the substrate surface. That is, for a surface that is negatively charged, there is a linear correspondence between dipping time and the amount of PPy deposited on the substrate. However, in the case of a positively charged surface, there is an apparent rest period of approximately 10-20 min, during which no PPy is deposited. From optical absorption spectroscopy and photoelectron emission studies etc., it became clear that oligomers of pyrrole were adsorbed on the positively charged surface during the rest period, as a result the polymerization reaction of PPy could proceed

Additional details

Identifiers

DOI
10.1016/j.tsf.2005.07.004;
PII
S0040-6090(05)00747-9;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
499
Journal Issue
1-2
Journal Page Range
p. 61-72
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
6. international conference on nano-molecular electronics
Acronym
ICNME 2004
Dates
15-17 Dec 2004
Place
Kobe (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37112423
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABSORPTION SPECTROSCOPY; DEPOSITION; FABRICATION; POLYMERIZATION; POLYMERS; PYRROLES; SURFACES; THIN FILMS
Descriptors DEC
AZOLES; CHEMICAL REACTIONS; FILMS; HETEROCYCLIC COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC NITROGEN COMPOUNDS; SPECTROSCOPY

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.