In situ polymerization process of polypyrrole ultrathin films
- 1. Department of Mechanical Engineering, Akashi National College of Technology, 679-3 Nishioka, Uozumi-cho, Akasi, Hyogo 674-8501 (Japan)
- 2. Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, University of Hyogo, Himeji Shosha Campus, 2167 Shosha, Himeji, Hyogo 671-2201 (Japan)
- 3. Kinden Corporation, 3-4 Honjo-Higashi, 2-Chome, Kita-ku, Osaka 531-8550 (Japan)
Description
A novel thin film processing technique has been developed for the fabrication of ultrathin films of conducting polymers with molecular-level control over thickness and multilayer architecture. This new self-assembly process opens up vast possibilities in applications which require large area, ultrathin films of conducting polymers and more importantly in applications that can take advantage of the unique interactions achievable in the complex, supermolecular architectures of multilayer films. In in situ polymerized polypyrrole (PPy), the deposition process strongly depends on the nature of the substrate surface. That is, for a surface that is negatively charged, there is a linear correspondence between dipping time and the amount of PPy deposited on the substrate. However, in the case of a positively charged surface, there is an apparent rest period of approximately 10-20 min, during which no PPy is deposited. From optical absorption spectroscopy and photoelectron emission studies etc., it became clear that oligomers of pyrrole were adsorbed on the positively charged surface during the rest period, as a result the polymerization reaction of PPy could proceed
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2005.07.004;
- PII
- S0040-6090(05)00747-9;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 499
- Journal Issue
- 1-2
- Journal Page Range
- p. 61-72
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 6. international conference on nano-molecular electronics
- Acronym
- ICNME 2004
- Dates
- 15-17 Dec 2004
- Place
- Kobe (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37112423
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; DEPOSITION; FABRICATION; POLYMERIZATION; POLYMERS; PYRROLES; SURFACES; THIN FILMS
- Descriptors DEC
- AZOLES; CHEMICAL REACTIONS; FILMS; HETEROCYCLIC COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC NITROGEN COMPOUNDS; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.