Published June 15, 2011 | Version v1
Journal article

A simple and highly effective process for the preparation of activated carbons with high surface area

  • 1. College of Chemistry, Jilin University, Changchun 130012 (China)

Description

Highlights: → High surface area activated carbon can be prepared by rice husk H3PO4 without pretreatment. → The characteristics of the activated carbon were greatly influenced by post-processing method. → The lower SiO2 content of the activated carbons, the higher pore volume the carbons had. → Some silica in rice husk reacted with H3PO4 to form SiP2O7 which could be removed by post-process. - Abstract: Activated carbons with high surface area were prepared by phosphoric acid as activation agent and rice husks as precursors. It was found that the characteristics of the activated carbons were influenced not only by the preparation but also by the post-processing method. The high surface area of the activated carbons was prepared under the optimum condition (50% H3PO4 with impregnation ratio of 5:1, activation temperature of 500 deg. C, activation time of 0.5 h, wash water temperature of 100 deg. C). SiO2 content could affect the surface area of activated carbons, either. The lower SiO2 content of the activated carbons, the higher pore volume the carbons had. The SiO2 content was 11.2% when used the optimum condition. The explanation was that silicon element in rice husks reacted with H3PO4 to form silicon phosphate (SiP2O7), and it could be proved further by X-ray diffraction analysis, SiP2O7 could be removed by post-process.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchemphys.2011.02.046

Additional details

Identifiers

DOI
10.1016/j.matchemphys.2011.02.046;
PII
S0254-0584(11)00157-X;

Publishing Information

Journal Title
Materials Chemistry and Physics
Journal Volume
127
Journal Issue
3
Journal Page Range
p. 495-500
ISSN
0254-0584
CODEN
MCHPDR

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.