Published November 24, 2010 | Version v1
Journal article

Quality Control On Strained Semiconductor Devices

  • 1. Centre Suisse d'Electronique et de Microtechnique, CSEM, Jaquet-Droz 1, CH-2002 Neuchatel (Switzerland)

Description

New semiconductor devices are based very often on strained silicon which promises to squeeze more device performance out of current devices. With strained silicon it is possible to get the same device performance using less power. The technique is using strain as a 'design element' for silicon to improve the device performance and has become a hot topic in semiconductor research in the past years. However in the same time topics like 'System in Package'(SiP) on thin wafers are getting more and more important. The chips of thin wafers in advanced packaging are extremely sensitive to induced stresses due to packaging issues. If we are using now strain as a design element for improving device performance we increase the sensitivity again and therefore also the risk of aging of such SiP's. High Resolution X-ray diffraction (HRXRD) techniques such as Rocking Curves (RC's) and Reciprocal Space Mapping (RSM) are therefore very powerful tools to study the stresses in packaged devices.

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1300
Journal Issue
1
Journal Page Range
p. 109-113
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
11. international workshop on stress-induced phenomena in metallization
Dates
12-14 Apr 2010
Place
Bad Schandau (Germany)

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42099690
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
AGING; DIFFRACTOMETERS; NEUTRON DIFFRACTION; QUALITY CONTROL; RESOLUTION; SEMICONDUCTOR DEVICES; SEMICONDUCTOR MATERIALS; SENSITIVITY; SILICON; STRAINS; STRESSES; X-RAY DIFFRACTION
Descriptors DEC
COHERENT SCATTERING; CONTROL; DIFFRACTION; ELEMENTS; MATERIALS; MEASURING INSTRUMENTS; SCATTERING; SEMIMETALS

Optional Information

Notes
(c) 2010 American Institute of Physics