Study on electrolytically deposited copper film on stainless steel surface for RF input couplers
Creators
- 1. Marui Galvanizing Co., Ltd., Himeji, Hyogo (Japan)
- 2. High Energy Accelerator Research Organization (KEK), Tsukuba, Ibaraki (Japan)
Description
A copper (Cu) film is electrolytically deposited on a stainless steel-made RF coupler used in a particle accelerator machine. The coupler after electroplated with a Cu film goes to a heat-treatment process for the brazing of components of the coupler. The brazing is performed at a temperature of ∼800degC in a high-temperature vacuum furnace. A residual resistivity ratio (RRR) of the Cu film decreases owing to the high-temperature heat-treatment process. We have been aiming to achieve a desired RRR value after the heat-treatment process. In this study, we have conducted an analysis of a Cu film, which was electrolytically deposited on a stainless-steel surface with an intermediate Cu strike layer, to find atomic diffusion from stainless steel to the Cu film due to heat-treatment. The impact of heat-treatment on the RRR value of the Cu film was evaluated. (author)
Availability note (English)
Available from https://www.pasj.jp/web_publish/pasj2020/proceedings/PDF/THPP/THPP29.pdfAdditional details
Additional titles
- Original title (English)
- #7B2C#17#56DE# #65E5##672C##52A0##901F##5668##5B66##4F1A##5E74##4F1A#
Identifiers
Publishing Information
- Imprint Title
- Proceedings of the 17th annual meeting of Particle Accelerator Society of Japan
- Imprint Pagination
- [971 p.]
- Journal Page Range
- p. 532-535
Conference
- Title
- 17. annual meeting of Particle Accelerator Society of Japan
- Acronym
- PASJ2020
- Dates
- 2-4 Sep 2020
- Place
- Online-held (Japan)
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 52080834
- Subject category
- S36: MATERIALS SCIENCE; S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Conference, Non-conventional Literature
- Descriptors DEI
- ACCELERATOR EXPERIMENTAL FACILITIES; ANNEALING; COPPER; COPPER SULFATES; DEPOSITS; ELECTRIC CONDUCTIVITY; ELECTROPLATING; KEK; RF SYSTEMS; SCANNING ELECTRON MICROSCOPY; STAINLESS STEELS; THIN FILMS; VACUUM FURNACES; X-RAY SPECTRA
- Descriptors DEC
- ALLOYS; CARBON ADDITIONS; COPPER COMPOUNDS; DEPOSITION; ELECTRICAL PROPERTIES; ELECTRODEPOSITION; ELECTROLYSIS; ELECTRON MICROSCOPY; ELEMENTS; FILMS; FURNACES; HEAT TREATMENTS; HIGH ALLOY STEELS; IRON ALLOYS; IRON BASE ALLOYS; JAPANESE ORGANIZATIONS; LYSIS; METALS; MICROSCOPY; NATIONAL ORGANIZATIONS; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; PLATING; SPECTRA; STEELS; SULFATES; SULFUR COMPOUNDS; SURFACE COATING; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Notes
- 3 refs., 5 figs., 1 tab. Imprint:This symposium was hold online;#7B2C#17#56DE# #65E5##672C##52A0##901F##5668##5B66##4F1A##5E74##4F1A#