Published February 4, 1975
| Version v1
Patent
Open
Contact ionization ion source
Creators
Description
An ion source in which an apertured or foraminous electrode having a multiplicity of openings is spaced from one or more active surfaces of an ionisation electrode, the active surfaces comprising a material capable of ionising by contact ionization a substance to be ionized supplied during operation to the active surface or surfaces comprises means for producing during operation a magnetic field which enables a stable plasma to be formed in the space between the active surface or surfaces and the apertured electrode, the field strength of the magnetic field being preferably in the range between 2 and 8 kilogauss. (U.S.)
Availability note (English)
MF available from INIS under the Report Number.Files
6214002.pdf
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(256.5 kB)
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Additional details
Additional titles
- Augmented title (English)
- Patent
Publishing Information
- Imprint Pagination
- 6 p.
- IPC:
- Int. Cl.H01j39/34.
- IPC
- Int. Cl.H01j39/34.
- Patent number
- US patent document 3,864,575
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 6214002
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Descriptors DEI
- ION SOURCES; PERFORMANCE; SPECIFICATIONS