Published February 4, 1975 | Version v1
Patent Open

Contact ionization ion source

Description

An ion source in which an apertured or foraminous electrode having a multiplicity of openings is spaced from one or more active surfaces of an ionisation electrode, the active surfaces comprising a material capable of ionising by contact ionization a substance to be ionized supplied during operation to the active surface or surfaces comprises means for producing during operation a magnetic field which enables a stable plasma to be formed in the space between the active surface or surfaces and the apertured electrode, the field strength of the magnetic field being preferably in the range between 2 and 8 kilogauss. (U.S.)

Availability note (English)

MF available from INIS under the Report Number.

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Additional details

Additional titles

Augmented title (English)
Patent

Publishing Information

Imprint Pagination
6 p.
IPC:
Int. Cl.H01j39/34.
IPC
Int. Cl.H01j39/34.
Patent number
US patent document 3,864,575

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
6214002
Subject category
S74: ATOMIC AND MOLECULAR PHYSICS;
Descriptors DEI
ION SOURCES; PERFORMANCE; SPECIFICATIONS