Construction of sputter ion source and application to IMA analysis

This paper describes a sputter ion source which makes use of secondary ions emitted from ion-bombarded solids, so which gives ion beam of any element in solid state. As a preliminary application, this source has been used as an ion source of IMA. Two samples of GaAs and AgAu-alloy were analyzed under the bombardment of alkali-metal ion beam of 10 to 60 nA and about 1 mm in diameter. It was shown that the alkali-metal ion bombardment gives more current of negative secondary ions for elements with strong electron affinity than that given by O2+ ion bombardment. (author)