Published June 23, 2010 | Version v1
Journal article

Fully automated, fixed exit, in vacuum double-multilayer monochromator for synchrotron-based hard X-ray micro-imaging applications

  • 1. Forschungszentrum Karlsruhe / K.I.T.-ANKA, Pf. 3640, D-76021 Karlsruhe (Germany)
  • 2. European Synchrotron Radiation Facility (ESRF), BP 220, F-38043 Grenoble (France)
  • 3. Federal Institute for Materials Research and Testing, D-12200 Berlin (Germany)
  • 4. Helmholtz Zentrum Berlin / BESSY II, Albert-Einstein- Str. 15, D-12489 Berlin (Germany)
  • 5. AXO Dresden GmbH, Siegfried-Raedel-Str. 31, D-01809 Heidenau (Germany)
  • 6. ACCEL Instruments GmbH (now Bruker Advanced Supercon), Friedrich-Ebert-Str. 1, D-51429 Bergisch Gladbach (Germany)

Description

We present a double multilayer monochromator (DMM) design which has been realized for the BAMline(BESSY-II light source, Germany) as well as in an updated version for the TopoTomo beamline (ANKA light source. Germany)[1-4]. The latter contains two pairs of multilayer stripes in order to avoid absorption edges of the coating material. For both DMMs, the second multilayer offers a meridional bending option for beam compression to increase the available photon flux density. Each multilayer mirror is equipped with a vertical stage for height adjustments allowing for compensation of varying incoming beam heights and giving a certain flexibility choosing the offset. The second multilayer can be moved in the beam direction in order to cover the full energy range available. Furthermore, a white beam option is available.

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1234
Journal Issue
1
Journal Page Range
p. 740-743
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
10. international conference on radiation instrumentation
Acronym
SRI 2009
Dates
27 Sep - 2 Oct 2009
Place
Melbourne (Australia)

Optional Information

Notes
(c) 2010 American Institute of Physics