Specification and Potential Application of Split Tube Furnace

Full-text:Split tube furnace is a tube furnace that can be opened to allow for the easy installation and removal of work tubes and reaction vessels. Located in the clean room laboratory at Block 75, Dengkil Complex, it has the maximum temperature of 1200 degree Celsius and maximum operating temperature of 1100 degree Celsius. However, for the maximum continuous temperature is set at 1150 degree Celsius. The main component in a tube furnace is heating chamber comprises of a circular furnace wall made of high-temperature ceramic. Kanthal Coil element are embedded into the ceramic by surround a central chamber for uniformly distributed heaters. This tube furnace has one (1) unit FUJI programmable temperature control with 64 ramps/soaks that fitted with type K thermocouple. This architecture guarantees the highest possible thermal uniformity for processing both inorganic and organic compounds. The tube furnace also provides the gas inlet/outlet in order to perform a reaction under a controlled atmosphere. In this study, the split tube furnace had been used to grow oxide layer on silicon wafer (SiO₂/Si) through dry oxidation method. From the study, the thickness and surface roughness of wafer were investigated. (author)