Published November 1, 1998
| Version v1
Journal article
At-wavelength metrologies for extreme ultraviolet lithography
Creators
- Attwood, David T.
- Anderson, Erik H.
- Batson, Phillip J.
- Beguiristain, H. Raul
- Bokor, Jeffrey
- Goldberg, Kenneth A.
- Gullikson, Eric M.
- Jackson, Keith H.
- Nguyen, K.
- Koike, Masato
- Medecki, Hector
- Mrowka, S.
- Tackaberry, Ron E.
- Tejnil, Edita
- Underwood, James H.
- Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (United States)
Description
no abstract available
Additional details
Publishing Information
- Journal Title
- FED Janaru
- Journal Volume
- 9
- Journal Page Range
- [10 p.]
- ISSN
- 0918-2772
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 33060396
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- EXTREME ULTRAVIOLET RADIATION; FABRICATION; FREQUENCY DEPENDENCE; INTEGRATED CIRCUITS; MASKING; MEASURING METHODS; WAVELENGTHS
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELECTRONIC CIRCUITS; MICROELECTRONIC CIRCUITS; RADIATIONS; ULTRAVIOLET RADIATION
Optional Information
- Contract/Grant/Project number
- AC03-76SF00098
- Notes
- Journal Publication Date: November 1998
- Funding organization
- US Department of Energy (United States)
- Secondary number(s)
- LBNL/ALS--1136