Published July 2009 | Version v1
Journal article

Degraded model of radiation-induced acceptor defects for GaN-based high electron mobility transistors (HEMTs)

  • 1. Beijing Microelectronics Technology Institute, Beijing 100076 (China)
  • 2. The School of Microelectronics, Xidian University, Xi'an 710071 (China)

Description

Using depletion approximation theory and introducing acceptor defects which can characterize radiation induced deep-level defects in AlGaN/GaN heterostructures, we set up a radiation damage model of AlGaN/GaN high electron mobility transistor (HEMT) to separately simulate the effects of several main radiation damage mechanisms and the complete radiation damage effect simultaneously considering the degradation in mobility. Our calculated results, consistent with the experimental results, indicate that thin AlGaN barrier layer, high Al content and high doping concentration are favourable for restraining the shifts of threshold voltage in the AlGaN/GaN HEMT; when the acceptor concentration induced is less than 1014cm−3, the shifts in threshold voltage are not obvious; only when the acceptor concentration induced is higher than 1016cm−3, will the shifts of threshold voltage remarkably increase; the increase of threshold voltage, resulting from radiation induced acceptor, mainly contributes to the degradation in drain saturation current of the current–voltage (I–V) characteristic, but has no effect on the transconductance in the saturation area. (condensed matter: structure, thermal and mechanical properties)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/18/7/049

Additional details

Identifiers

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
18
Journal Issue
7
Journal Page Range
p. 2912-2919
ISSN
1674-1056