Published August 7, 2014 | Version v1
Journal article

Modeling direct interband tunneling. I. Bulk semiconductors

  • 1. Department of Electrical Engineering, University of California, Los Angeles, Los Angeles, California 90095 (United States)
  • 2. California NanoSystems Institute, University of California, Los Angeles, Los Angeles, California 90095 (United States)

Description

Interband tunneling is frequently studied using the semiclassical Kane model, despite uncertainty about its validity. Revisiting the physical basis of this formula, we find that it neglects coupling to other bands and underestimates transverse tunneling. As a result, significant errors can arise at low and high fields for small and large gap materials, respectively. We derive a simple multiband tunneling model to correct these defects analytically without arbitrary parameters. Through extensive comparison with band structure and quantum transport calculations for bulk InGaAs, InAs, and InSb, we probe the accuracy of the Kane and multiband formulas and establish the superiority of the latter. We also show that the nonlocal average electric field should be used when applying either of these models to nonuniform potentials. Our findings are important for efficient analysis and simulation of bulk semiconductor devices involving tunneling

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
116
Journal Issue
5
Journal Page Range
p. 054508-054508.9
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
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