Published January 2000 | Version v1
Journal article Metadata-only

Intermediate metastable phase formation during crystallization of electrolytic X-ray amorphous tantalum boride coatings

Creators

  • 1. Inst. Khimii i Tekhnologii Redkikh Ehlementov i Mineral'nogo Syr'ya im. I.V. Tananaeva Kol'skogo Nauchnogo Tsentra RAN, Apatity (Russian Federation)

Description

The methods of chemical, X-ray phase and differential thermal analyses are used to study formation conditions in the course of thermal treatment of metastable intermediate phase of TaB1+x composition and its transfer to Ta3B4 stable compound. Crystallization dynamics of X-ray amorphous coatings of tantalum borides prepared by high-temperature electrochemical synthesis in oxofluoride melts at 750 deg C and molar ratio O/(Ta + B) = 1 discussed

Abstract (Russian)

Методами химического, рентгенофазового и дифференциального термического анализов исследованы условия образования в процессе термообработки метастабильной промежуточной фазы состава TaB1+x и ее перехода в стабильное соединение Ta3B4. Обсуждается динамика кристаллизации рентгеноаморфных покрытий из боридов тантала, полученных высокотемпературным электрохимическим синтезом в оксофторидных расплавах при 750 град. С и молярном отношении O/(Ta + B) = 1

Additional details

Additional titles

Original title (Russian)
Образование промежуточной метастабильной фазы при кристаллизастии электролитических рентгеноаморфных покрытий из боридов тантала

Publishing Information

Journal Title
Zhurnal Prikladnoj Khimii
Journal Volume
73
Journal Issue
1
Journal Page Range
p. 156-158
ISSN
0044-4618
CODEN
ZPKHAB

INIS

Country of Publication
Russian Federation
Country of Input or Organization
Russian Federation
INIS RN
31036870
Subject category
S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Descriptors DEI
ANNEALING; CHEMICAL COMPOSITION; CRYSTALLIZATION; ELECTRODEPOSITED COATINGS; ELECTRODEPOSITION; MOLTEN SALTS; OXYFLUORIDES; PHASE STUDIES; TANTALUM BORIDES; TEMPERATURE RANGE 1000-4000 K
Descriptors DEC
BORIDES; BORON COMPOUNDS; COATINGS; DEPOSITION; ELECTROLYSIS; FLUORINE COMPOUNDS; HALOGEN COMPOUNDS; HEAT TREATMENTS; LYSIS; OXYGEN COMPOUNDS; OXYHALIDES; PHASE TRANSFORMATIONS; REFRACTORY METAL COMPOUNDS; SALTS; SURFACE COATING; TANTALUM COMPOUNDS; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS

Optional Information

Notes
11 refs.; 2 figs.