Published July 1974 | Version v1
Journal article

Effect of deep migration of radiation defects on exoemission from silicon

  • 1. Gor'kovskij Gosudarstvennyj Univ. (USSR)

Description

no abstract available

Additional details

Additional titles

Original title (Russian)
Влияние глубокой миграции радиационных дефектов на экзоэмиссию с кремния

Publishing Information

Journal Title
Fiz. Tverd. Tela
Journal Volume
16
Journal Issue
7
Series
Fiz. Tverd. Tela.
Journal Page Range
2151-2153

INIS

Country of Publication
USSR
Country of Input or Organization
USSR
INIS RN
6163741
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
No Abstract
Descriptors DEI
DIFFUSION; ELECTRON EMISSION; HIGH TEMPERATURE; ION IMPLANTATION; IRRADIATION; MEDIUM TEMPERATURE; MIGRATION LENGTH; POINT DEFECTS; SILICON; THICKNESS; TIME DEPENDENCE; TUNGSTEN IONS
Descriptors DEC
CHARGED PARTICLES; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DIMENSIONS; ELEMENTS; EMISSION; IONS; SEMIMETALS

Optional Information

Notes
Published in summary form only. For English translation see the journal Sov. Phys. - Solid State.