Published December 1995
| Version v1
Journal article
Electron spin resonance evidence that E'γ centers can behave as switching oxide traps
- 1. Pennsylvania State Univ., University Park, PA (United States). Dept. of Engineering Science and Mechanics
- 2. Army Research Lab., Adelphi, MD (United States)
Description
The authors provide direct and unambiguous experimental spectroscopic evidence for the structure of a switching oxide trap in thermally grown SiO2 gate oxides on Si. Switching oxide traps can switch charge state in response to changes in the voltage applied to the gate of a metal-oxide-semiconductor field-effect-transistor. Electron spin resonance measurements reveal that some E'γ centers (a hole trapped at an oxygen vacancy) can behave as switching oxide traps. For reasons discussed in a cited reference, the authors use the term switching oxide trap to refer to the defects responsible for the post-irradiation switching phenomena
Additional details
Publishing Information
- Journal Title
- IEEE Transactions on Nuclear Science
- Journal Volume
- 42
- Journal Issue
- 6Pt1
- Journal Page Range
- p. 1744-1749.
- ISSN
- 0018-9499
- CODEN
- IETNAE
Conference
- Title
- 32. annual IEEE international nuclear and space radiation effects conference.
- Dates
- 17-21 Jul 1995.
- Place
- Madison, WI (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 27045562
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CRYSTAL DEFECTS; ELECTRICAL PROPERTIES; MOSFET; PHYSICAL RADIATION EFFECTS; SILICON; SILICON OXIDES
- Descriptors DEC
- CHALCOGENIDES; CRYSTAL STRUCTURE; ELEMENTS; FIELD EFFECT TRANSISTORS; MOS TRANSISTORS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATION EFFECTS; SEMICONDUCTOR DEVICES; SEMIMETALS; SILICON COMPOUNDS; TRANSISTORS
Optional Information
- Secondary number(s)
- CONF-950716--.