Lattice location and diffusion of W implanted in Mg and Al single crystals
- 1. Dept. de Fisica, ICEN/LNETI, Sacavem (Portugal)
- 2. Kernforschungszentrum Karlsruhe, Inst. fuer Nukleare Festkoerperphysik (Germany)
- 3. Centro de Fisica Nuclear, Univ. de Lisboa (Portugal)
Description
Tungsten was implanted in Mg single crystals at 293 and 77 K. A rather high substitutional fraction, fs=0.8, was observed after implanting W at 293 K with peak concentrations up to 0.3 at.%. With increasing peak concentration up to 2.7 at.% W, fs decreases to 0.3. Implanting 0.3 at.% W at 77 K resulted a fs value of 1, which did not change after warming up to 293 K. Annealing at 553 K causes a recovery of the host lattice, which however does not affect fs. The diffusion of W in Mg is much lower than expected from the Mg self-diffusion coefficient, which may be explained by internal oxidation of the W atoms. In the case of the WAl system, W is completely substitutional after implantation at 293 and 7 K up to peak concentrations of about 5 at.%. (orig.)
Additional details
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B
- Journal Volume
- 63
- Journal Issue
- 3
- Series
- Nucl. Instrum. Methods Phys. Res., Sect. B.
- Journal Page Range
- 283-290
- ISSN
- 0168-583X
- CODEN
- NIMBE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 23061990
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM; ANGULAR DISTRIBUTION; ANNEALING; BOND ANGLE; BOND LENGTHS; CHEMICAL COMPOSITION; CRYSTAL STRUCTURE; DIFFUSION; ION CHANNELING; ION IMPLANTATION; LATTICE PARAMETERS; MAGNESIUM; MONOCRYSTALS; OXIDATION; SELF-DIFFUSION; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0000-0013 K; TEMPERATURE RANGE 0013-0065 K; TEMPERATURE RANGE 0065-0273 K; TEMPERATURE RANGE 0273-0400 K; TEMPERATURE RANGE 0400-1000 K; TEMPERATURE RANGE 1000-4000 K; TUNGSTEN IONS
- Descriptors DEC
- ALKALINE EARTH METALS; CHANNELING; CHARGED PARTICLES; CHEMICAL REACTIONS; CRYSTALS; DISTRIBUTION; ELEMENTS; HEAT TREATMENTS; IONS; METALS; TEMPERATURE RANGE