Published March 2007
| Version v1
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Status of laser-produced plasma EUV light source
- 1. Gigaphoton Inc., Oyama, Tochigi (Japan)
- 2. Japan Atomic Energy Agency, Quantum Beam Science Directorate, Kizu, Kyoto (Japan)
Description
The development status of the key technologies for a HVM laser produced plasma EUV light source is presented. This includes the high-power RF-excited CO2 laser, the Sn droplet target and the collector mirror lifetime enhancement (debris, ion mitigation). Basic experiments that support the development, e.g. a conversion efficiency of 2.8% has been obtained with a 15ns TEA CO2 laser and a Sn wire, as well as a general outline of the system development, i.e. system scaling, towards >115 W is given. (author)
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Additional details
Publishing Information
- Imprint Title
- Proceedings of the joint meeting of ultrafast pulse high intensity laser research collaboration and JAEA-KPSI 7th symposium on advanced photon research
- Imprint Pagination
- 259 p.
- Journal Page Range
- p. 197-200
- Report number
- JAEA-Conf--2007-001
Conference
- Title
- Joint meeting of ultrafast pulse high intensity laser research collaboration; 7. JAEA-KPSI symposium on advanced photon research
- Dates
- 10-12 May 2006
- Place
- Kizu, Kyoto (Japan)
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 38102279
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CARBON DIOXIDE LASERS; CHARGE STATES; EXTREME ULTRAVIOLET RADIATION; IONS; LASER TARGETS; LASER-PRODUCED PLASMA; LIGHT SOURCES; MIRRORS; TIN; XENON
- Descriptors DEC
- CHARGED PARTICLES; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUIDS; GAS LASERS; GASES; LASERS; METALS; NONMETALS; PLASMA; RADIATION SOURCES; RADIATIONS; RARE GASES; TARGETS; ULTRAVIOLET RADIATION
Optional Information
- Notes
- 6 refs., 2 figs.