Published September 1998 | Version v1
Journal article

Silicon isotope enrichment for low activation

  • 1. National Research Inst. for Metals, Ibaraki (Japan)

Description

Silicon isotope separation from hexafluorodisilane (Si2F6) has been examined using a CO2 pulsed laser. Si2F6 containing certain isotopes was preferentially decomposed to SiF4 depending on the wavenumber (k) of the laser. 29Si and 30Si were concentrated in the SiF4 produced at k=945-955 cm-1, and in the residual Si2F6 at k=970-980 cm-1. The SiF4 containing 30Si of about 43.3% and 29Si at a maximum of 12.3% was continuously produced with a yield of 4.4% at k=951.203 cm-1 and 9.6% at 956.205 cm-1, respectively. The decomposition reaction of Si2F6 by the infrared laser irradiation could be explained as Si2F6(gas)+nhν→SiF4(gas)+SiF2(solid), calculated from a mass balance analysis of the experimental results. A 30Si concentration higher than 90% was estimated to be achievable by repeating the irradiation of the residual Si2F6 at around k=975 cm-1 and finally decomposing the Si2F6 to SiF4 at k=951.203 cm-1. SiC enriched with 29Si and 30Si was predicted to show an excellent low activation behavior in fusion neutron environments. (orig.)

Additional details

Publishing Information

Journal Title
Fusion Engineering and Design
Journal Volume
41
Series
Part B
Journal Page Range
p. 173-179
ISSN
0920-3796
CODEN
FEDEEE

Conference

Title
4. international symposium on fusion nuclear technology (ISFNT-4)
Dates
6-11 Apr 1997
Place
Tokyo (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
Switzerland
INIS RN
30000995
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
LASER ISOTOPE SEPARATION; SILICON; SILICON COMPOUNDS; THERMONUCLEAR REACTOR MATERIALS
Descriptors DEC
ELEMENTS; ISOTOPE SEPARATION; MATERIALS; SEMIMETALS; SEPARATION PROCESSES

Optional Information

Notes
10 refs.