Published October 2008 | Version v1
Journal article

Response to 'Comment on 'Influence of exciting frequency on gas and ion rotational temperatures of nitrogen capacitively coupled plasma'' [Phys. Plasmas 15, 104701 (2008)]

  • 1. Jiangsu Key Laboratory of Thin Films, School of Physical Science and Technology, Soochow University, Suzhou, 215006 (China)

Description

no abstract available

Additional details

Identifiers

Publishing Information

Journal Title
Physics of Plasmas
Journal Volume
15
Journal Issue
10
Journal Page Range
p. 104702-104702.1
ISSN
1070-664X
CODEN
PHPAEN

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41005172
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
No Abstract
Descriptors DEI
ION TEMPERATURE; NITROGEN; PLASMA; ROTATIONAL STATES
Descriptors DEC
ELEMENTS; ENERGY LEVELS; EXCITED STATES; NONMETALS

Optional Information

Notes
(c) 2008 American Institute of Physics