Published October 2009
| Version v1
Journal article
Basics of spectroscopic instruments. X-ray fluorescence spectrometer, X-ray absorption spectrometer, and X-ray photoelectron spectrometer
- 1. Rigaku Corp., Takatsuki, Osaka (Japan)
- 2. Rigaku Corp., Akishima, Tokyo (Japan)
- 3. ULVAC-PHI, Incorporated, Chigasaki, Kanagawa (Japan)
Description
Basics of x-ray fluorescence spectrometer, x-ray absorption spectrometer, and x-ray photoelectron spectrometer are reviewed. X-ray fluorescence spectrometry and x-ray absorption spectroscopy are non-destructive and bulk-sensitive techniques of elemental and chemical-state analyses, respectively. X-ray photoelectron spectroscopy is generally employed for characterizing surfaces and/or adsorbents of solid materials. The composition and each element of these spectroscopic devices are described, and qualitative and quantitative analytical procedures are explained using recent examples. (author)
Additional details
Publishing Information
- Journal Title
- Bunko Kenkyu
- Journal Volume
- 58
- Journal Issue
- 5
- Journal Page Range
- p. 224-239
- ISSN
- 0038-7002
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 41059036
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- CRYSTALS; ELECTRIC CHARGES; FLUORESCENCE SPECTROSCOPY; LABORATORY EQUIPMENT; NONDESTRUCTIVE ANALYSIS; OPTICAL DISPERSION; OPTICAL SYSTEMS; RADIATION ABSORPTION ANALYSIS; SPECTROMETERS; SURFACE PROPERTIES; X-RAY FLUORESCENCE ANALYZERS; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHEMICAL ANALYSIS; ELECTRON SPECTROSCOPY; EMISSION SPECTROSCOPY; EQUIPMENT; MEASURING INSTRUMENTS; NONDESTRUCTIVE ANALYSIS; PHOTOELECTRON SPECTROSCOPY; SPECTROSCOPY
Optional Information
- Notes
- 32 refs., 27 figs., 2 tabs.