Published June 1, 2009
| Version v1
Journal article
Influence of electron irradiation on the switching speed in insulated gate bipolar transistors
- 1. Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)
Description
The influence of electron irradiation on the switching speed in insulated gate bipolar transistors (IGBT) with different epitaxial layer thicknesses is discussed in detail. The experimental results prove that the fall time of IGBT increases when increasing the thickness of the epitaxial layer. However, there is no obvious difference between the ratios of the fall time after irradiation to those before irradiation for different epitaxial layer thicknesses. The increase in switching speed of the IGBT is accompanied by an increase in the forward drop, and a trade-off curve between forward voltage drop and fall time of IGBT is presented.
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/30/6/064008Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 30
- Journal Issue
- 6
- Journal Page Range
- [3 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41079155
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ELECTRONS; EPITAXY; IRRADIATION; LAYERS; THICKNESS; TRANSISTORS; VELOCITY; VOLTAGE DROP
- Descriptors DEC
- CRYSTAL GROWTH METHODS; DIMENSIONS; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; SEMICONDUCTOR DEVICES