Published June 1, 2009 | Version v1
Journal article

Influence of electron irradiation on the switching speed in insulated gate bipolar transistors

  • 1. Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)

Description

The influence of electron irradiation on the switching speed in insulated gate bipolar transistors (IGBT) with different epitaxial layer thicknesses is discussed in detail. The experimental results prove that the fall time of IGBT increases when increasing the thickness of the epitaxial layer. However, there is no obvious difference between the ratios of the fall time after irradiation to those before irradiation for different epitaxial layer thicknesses. The increase in switching speed of the IGBT is accompanied by an increase in the forward drop, and a trade-off curve between forward voltage drop and fall time of IGBT is presented.

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/30/6/064008

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
30
Journal Issue
6
Journal Page Range
[3 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41079155
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ELECTRONS; EPITAXY; IRRADIATION; LAYERS; THICKNESS; TRANSISTORS; VELOCITY; VOLTAGE DROP
Descriptors DEC
CRYSTAL GROWTH METHODS; DIMENSIONS; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; SEMICONDUCTOR DEVICES