Modeling plasma discharges
- 1. Univ. of California at Berkeley, Berkeley, CA (USA)
Description
Complete models are needed to understand the basic scaling behavior of properties such as species density, temperature and ionization rate as control parameters such as gas composition, pressure, electrical power and discharge geometry are varied. Such models become increasingly useful for physical understanding and design as the number of control parameters or the discharge complexity increases; e.g., combined dc-rf discharges, discharges with dc magnetic fields, complicated geometries, heating mechanisms, chemistry, etc. These effects must be incorporated into the simple models. The authors are studying reflex heating of electrons by the oscillating sheaths in a parallel plate rf discharge. This mechanisms can compete with the usual rf ohmic heating in low pressure, high frequency discharges. They are also studying geometrical effects in the dc, planar magnetron discharge
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (USA)
- Imprint Title
- The 1987 IEEE international conference on plasma science (Abstracts)
- Journal Page Range
- p. 115-116.
Conference
- Title
- IEEE international conference on plasma science.
- Dates
- 1-3 Jun 1987.
- Place
- Crystal City, VA (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 19056741
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHEMICAL COMPOSITION; CHEMISTRY; ELECTROMAGNETIC FIELDS; ELECTRONS; IONIZATION; MAGNETRONS; PLASMA DENSITY; PLASMA HEATING; PLASMA RINGS; PLASMA SHEATH; PLASMA SIMULATION; PLASMA WAVES
- Descriptors DEC
- ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTARY PARTICLES; EQUIPMENT; FERMIONS; HEATING; LEPTONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; SIMULATION