Strain-induced modulation versus superlattice ordering in epitaxial (GaIn)P layers
- 1. Materials Science Center, Philipps University Marburg, Hans-Meerwein-Strasse, 35032 Marburg (Germany)
Description
One main goal of the present work was to perform specific metal-organic vapor-phase epitaxy experiments to prove existing models for the fundamental process of superlattice ordering in the model system (GaIn)P. Applying a modulated-growth regime, we prepared (GaIn)P/GaAs multilayers, which enabled us to follow the structural and morphological development in dependence on the deposition cycle of the constituent binary components by transmission electron microscopy and electron diffraction investigations. The thickness of the alternating deposition layers was varied in the range 0.40≤n≤1.66. From the systematic investigations we could gain new insight into the mechanisms of the reconstruction of group-V stabilized growth surfaces and of the general role surface reconstruction processes play in CuPt superlattice ordering. A competitive interaction was revealed between the mechanisms of ordering and processes that lead to morphological and compositional modulation structures. The lattice mismatch of the constituent binary alloys and the accumulation of the misfit strains is suggested as the main driving force for the modulation. Those self-organization capabilities of strained epitaxial layers are of considerable interest in view of low-dimensional confinement formations
Additional details
Identifiers
- PII
- S0163-1829(00)00843-2;
Publishing Information
- Journal Title
- Physical Review. B, Condensed Matter and Materials Physics
- Journal Volume
- 62
- Journal Issue
- 23
- Journal Page Range
- p. 15826-15833
- ISSN
- 1098-0121
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35075776
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; ELECTRON DIFFRACTION; GALLIUM ARSENIDES; GALLIUM PHOSPHIDES; INDIUM PHOSPHIDES; LAYERS; SEMICONDUCTOR MATERIALS; STRAINS; SUPERLATTICES; SURFACES; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR PHASE EPITAXY
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CHEMICAL COATING; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; DEPOSITION; DIFFRACTION; DIMENSIONS; ELECTRON MICROSCOPY; EPITAXY; GALLIUM COMPOUNDS; INDIUM COMPOUNDS; MATERIALS; MICROSCOPY; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PNICTIDES; SCATTERING; SURFACE COATING
Optional Information
- Notes
- (c) 2000 The American Physical Society