Published December 2011 | Version v1
Journal article

Doubly resonant three-photon double ionization of Ar atoms induced by an EUV free-electron laser

  • 1. Institute of Nuclear Physics, Moscow State University, Moscow 119991 (Russian Federation)
  • 2. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577 (Japan)
  • 3. Institute of Atomic and Molecular Physics, Jilin University, Changchun 130012 (China)
  • 4. RIKEN, XFEL Project Head Office, Sayo, Hyogo 679-5148 (Japan)
  • 5. European XFEL GmbH, D-22761 Hamburg (Germany)
  • 6. FOM Institute AMOLF, NL-1098 XG Amsterdam (Netherlands)
  • 7. Max-Born-Institut, Max-Born Strasse 2A, D-12489 Berlin (Germany)
  • 8. Department of Physics, Lund University, Post Office Box 118, SE-22100 Lund (Sweden)
  • 9. Department of Physics, Kyoto University, Kyoto 606-8502 (Japan)

Description

A mechanism for three-photon double ionization of atoms by extreme-ultraviolet free-electron laser pulses is revealed, where in a sequential process the second ionization step, proceeding via resonant two-photon ionization of ions, is strongly enhanced by the excitation of ionic autoionizing states. In contrast to the conventional model, the mechanism explains the observed relative intensities of photoelectron peaks and their angular dependence in three-photon double ionization of argon.

Additional details

Identifiers

Publishing Information

Journal Title
Physical Review. A
Journal Volume
84
Journal Issue
6
Journal Page Range
p. 063405-063405.4
ISSN
1050-2947
CODEN
PLRAAN

Optional Information

Notes
(c) 2011 American Institute of Physics