Published May 1993 | Version v1
Miscellaneous Metadata-only

Development and investigation of micron- and submicron patterning of layers for HTSC-devices. Final report

Creators

Description

The patterning of HTSC-substrates and HTSC-layers was investigated. Lithografic technologies were fotolithography (down to 2 μm linewidth) and electron-beam lithography (down to 100 nm linewidth). Pattern transfer was made by ion-beam etching only. The minimum linewidth of YBCO-bridges in functionable devices was 2 μm with respect of the heat load during pattern transfer. Furthermore an inhibit-layer technology was developed and investigated. SQUIDs with working temperatures of 77 K were realised with our patterning technologies. (orig.)

Availability note (English)

Available from TIB Hannover: F94B0364+a.

Abstract (German)

Die Strukturierung von HTSL-Substraten und HTSL-Schichten wurde untersucht. Lithografische Technologien waren die Fotolithografie (bis min. 2 μ Strukturbreite) und die Elektronenstrahllithografie (bis min. 100 nm Strukturbreite). Die Strukturuebertragung geschah ausschliesslich mit Ionenstrahlaetzen. Die funktionsfaehige minimale Strukturbreite lag in YBCO-123-Schichten, durch die thermische Belastung beim Aetzen bedingt, um ca. 2 μm. Weiterhin wurde eine Inhibit-layer-Technologie entwickelt und untersucht. Mit den Technologien konnte die Strukturierung fuer funktionsfaehige SQUIDs mit Arbeitstemperaturen bis 77 K realisiert werden. (orig.)

Additional details

Additional titles

Original title (German)
Entwicklung und Untersuchung der Mikrometer- und Submikrometerstrukturierung von Schichten fuer HTSL-Bauelemente. Abschlussbericht

Publishing Information

Imprint Pagination
49 p.

INIS

Country of Publication
Germany
Country of Input or Organization
Germany
INIS RN
26004571
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
EPITAXY; ETCHING; HIGH-TC SUPERCONDUCTORS; LAYERS; SQUID DEVICES; SUPERCONDUCTING FILMS; TEXTURE
Descriptors DEC
CRYSTAL GROWTH METHODS; ELECTRONIC EQUIPMENT; EQUIPMENT; FILMS; FLUXMETERS; MEASURING INSTRUMENTS; MICROWAVE EQUIPMENT; SUPERCONDUCTING DEVICES; SUPERCONDUCTORS

Optional Information

Contract/Grant/Project number
Foerderkennzeichen BMFT 13N5922
Funding organization
Bundesministerium fuer Forschung und Technologie, Bonn (Germany).