Published 2003 | Version v1
Miscellaneous

Study of deposition rae coating of Ag thin films by magnetron sputtering

Description

Exact knowledge about deposition rate and its distribution and variation of them with respect to coating parameters (Gas pressure, Distance, discharge current,..) is very vital. In this experimental research coating of Ag thin films by magnetron sputtering have been carried out over Ar pressure range of 10-2-10-1 mbar, and discharge current up to 1000 m.A, and distance between glass substrates to silver target (Cathode) was changed from 5 to 15 cm. The obtained results have been investigated by help of computer curve fitting, and these studies show a very good agreement for the conditions used in this work

Availability note (English)

Available from Atomic Energy Organization of Iran

Additional details

Additional titles

Original title (Persian)
Barresi va motal-e -ye tabe-e tozi-a ahang-a anbasht-a laye-ye nazoke-e noqreh ba kandopash magnetron

Publishing Information

Imprint Place
Yazd (Iran, Islamic Republic of)
Imprint Pagination
[4 p.]

Conference

Title
6. Conference of Condensed Matter
Original Conference Title
Sheshomin konferance-e madeh-ye chegal anjoman fizik-e Iran
Dates
1-2 Feb 2003
Place
Yazd (Iran, Islamic Republic of)

INIS

Country of Publication
Iran, Islamic Republic of
Country of Input or Organization
Iran, Islamic Republic of
INIS RN
35074710
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference, Numerical Data, Non-conventional Literature
Descriptors DEI
ARGON; DEPOSITION; ELECTRIC DISCHARGES; EXPERIMENTAL DATA; MAGNETRONS; SILVER; SPUTTERING; THIN FILMS; VACUUM SYSTEMS
Descriptors DEC
DATA; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; FLUIDS; GASES; INFORMATION; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; NUMERICAL DATA; RARE GASES; TRANSITION ELEMENTS