Published 2003
| Version v1
Miscellaneous
Study of deposition rae coating of Ag thin films by magnetron sputtering
Description
Exact knowledge about deposition rate and its distribution and variation of them with respect to coating parameters (Gas pressure, Distance, discharge current,..) is very vital. In this experimental research coating of Ag thin films by magnetron sputtering have been carried out over Ar pressure range of 10-2-10-1 mbar, and discharge current up to 1000 m.A, and distance between glass substrates to silver target (Cathode) was changed from 5 to 15 cm. The obtained results have been investigated by help of computer curve fitting, and these studies show a very good agreement for the conditions used in this work
Availability note (English)
Available from Atomic Energy Organization of IranAdditional details
Additional titles
- Original title (Persian)
- Barresi va motal-e -ye tabe-e tozi-a ahang-a anbasht-a laye-ye nazoke-e noqreh ba kandopash magnetron
Publishing Information
- Imprint Place
- Yazd (Iran, Islamic Republic of)
- Imprint Pagination
- [4 p.]
Conference
- Title
- 6. Conference of Condensed Matter
- Original Conference Title
- Sheshomin konferance-e madeh-ye chegal anjoman fizik-e Iran
- Dates
- 1-2 Feb 2003
- Place
- Yazd (Iran, Islamic Republic of)
INIS
- Country of Publication
- Iran, Islamic Republic of
- Country of Input or Organization
- Iran, Islamic Republic of
- INIS RN
- 35074710
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference, Numerical Data, Non-conventional Literature
- Descriptors DEI
- ARGON; DEPOSITION; ELECTRIC DISCHARGES; EXPERIMENTAL DATA; MAGNETRONS; SILVER; SPUTTERING; THIN FILMS; VACUUM SYSTEMS
- Descriptors DEC
- DATA; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; FLUIDS; GASES; INFORMATION; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; NUMERICAL DATA; RARE GASES; TRANSITION ELEMENTS