Structural and optical characterization of self-assembled Ge nanocrystal layers grown by plasma-enhanced chemical vapor deposition
- 1. Van der Waals-Zeeman Institute, University of Amsterdam, Science Park 904, 1098 XH Amsterdam (Netherlands)
- 2. Laboratory of Photonics and Microwave Engineering, KTH, Royal Institute of Technology, SE-16440 Kista (Sweden)
Description
We present a structural and optical study of solid-state dispersions of Ge nanocrystals prepared by plasma-enhanced chemical vapor deposition. Structural analysis shows the presence of nanocrystalline germanium inclusions embedded in an amorphous matrix of Si-rich SiO2. Optical characterization reveals two prominent emission bands centered around 2.6 eV and 3.4 eV, and tunable by excitation energy. In addition, the lower energy band shows an excitation power-dependent blue shift of up to 0.3 eV. Decay dynamics of the observed emission contains fast (nanosecond) and slow (microseconds) components, indicating contributions of several relaxation channels. Based on these material characteristics, a possible microscopic origin of the individual emission bands is discussed. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/25/40/405705Additional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 25
- Journal Issue
- 40
- Journal Page Range
- [8 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46082698
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; CRYSTALS; DISPERSIONS; EMISSION; EV RANGE; EXCITATION; GERMANIUM; NANOSTRUCTURES; PLASMA; RELAXATION; SILICON OXIDES; SOLIDS
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; ELEMENTS; ENERGY RANGE; ENERGY-LEVEL TRANSITIONS; METALS; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS; SURFACE COATING