Published October 10, 2014 | Version v1
Journal article

Structural and optical characterization of self-assembled Ge nanocrystal layers grown by plasma-enhanced chemical vapor deposition

  • 1. Van der Waals-Zeeman Institute, University of Amsterdam, Science Park 904, 1098 XH Amsterdam (Netherlands)
  • 2. Laboratory of Photonics and Microwave Engineering, KTH, Royal Institute of Technology, SE-16440 Kista (Sweden)

Description

We present a structural and optical study of solid-state dispersions of Ge nanocrystals prepared by plasma-enhanced chemical vapor deposition. Structural analysis shows the presence of nanocrystalline germanium inclusions embedded in an amorphous matrix of Si-rich SiO2. Optical characterization reveals two prominent emission bands centered around 2.6 eV and 3.4 eV, and tunable by excitation energy. In addition, the lower energy band shows an excitation power-dependent blue shift of up to 0.3 eV. Decay dynamics of the observed emission contains fast (nanosecond) and slow (microseconds) components, indicating contributions of several relaxation channels. Based on these material characteristics, a possible microscopic origin of the individual emission bands is discussed. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/25/40/405705

Additional details

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
25
Journal Issue
40
Journal Page Range
[8 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46082698
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; CRYSTALS; DISPERSIONS; EMISSION; EV RANGE; EXCITATION; GERMANIUM; NANOSTRUCTURES; PLASMA; RELAXATION; SILICON OXIDES; SOLIDS
Descriptors DEC
CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; ELEMENTS; ENERGY RANGE; ENERGY-LEVEL TRANSITIONS; METALS; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS; SURFACE COATING