Published February 2014
| Version v1
Journal article
Hollow metal target magnetron sputter type radio frequency ion source
Creators
- 1. Graduate School of Science and Engineering, Doshisha University, Kyoto 610–0321 (Japan)
- 2. Kansai Institute, Advanced Industrial Science and Technology, Osaka 563–8577 (Japan)
Description
A 70 mm diameter 70 mm long compact ion source equipped with a hollow sputtering target has been designed and tested. The hollow sputtering target serves as the radio frequency (RF) plasma excitation electrode at 13.56 MHz. A stable beam of Cu+ has been extracted when Ar was used as the discharge support gas. In the extracted beam, Cu+ had occupied more than 85% of the total ion current. Further increase in Cu+ ions in the beam is anticipated by increasing the RF power and Ar pressure
Additional details
Identifiers
- DOI
- 10.1063/1.4857255;
Publishing Information
- Journal Title
- Review of Scientific Instruments
- Journal Volume
- 85
- Journal Issue
- 2
- Journal Page Range
- vp.
- ISSN
- 0034-6748
- CODEN
- RSINAK
Conference
- Title
- 14. international conference on ion sources
- Acronym
- ICIS 2011
- Dates
- 12-16 Sep 2011
- Place
- Giardini-Naxos, Sicily (Italy)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45074773
- Subject category
- S36: MATERIALS SCIENCE; S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COPPER IONS; EXCITATION; ION BEAMS; ION SOURCES; MAGNETRONS; MHZ RANGE 01-100; RADIOWAVE RADIATION; SPUTTERING
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; ELECTROMAGNETIC RADIATION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ENERGY-LEVEL TRANSITIONS; EQUIPMENT; FREQUENCY RANGE; IONS; MHZ RANGE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; RADIATIONS
Optional Information
- Notes
- (c) 2014 AIP Publishing LLC