Published February 2014 | Version v1
Journal article

Hollow metal target magnetron sputter type radio frequency ion source

  • 1. Graduate School of Science and Engineering, Doshisha University, Kyoto 610–0321 (Japan)
  • 2. Kansai Institute, Advanced Industrial Science and Technology, Osaka 563–8577 (Japan)

Description

A 70 mm diameter 70 mm long compact ion source equipped with a hollow sputtering target has been designed and tested. The hollow sputtering target serves as the radio frequency (RF) plasma excitation electrode at 13.56 MHz. A stable beam of Cu+ has been extracted when Ar was used as the discharge support gas. In the extracted beam, Cu+ had occupied more than 85% of the total ion current. Further increase in Cu+ ions in the beam is anticipated by increasing the RF power and Ar pressure

Additional details

Identifiers

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
85
Journal Issue
2
Journal Page Range
vp.
ISSN
0034-6748
CODEN
RSINAK

Conference

Title
14. international conference on ion sources
Acronym
ICIS 2011
Dates
12-16 Sep 2011
Place
Giardini-Naxos, Sicily (Italy)

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45074773
Subject category
S36: MATERIALS SCIENCE; S74: ATOMIC AND MOLECULAR PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
COPPER IONS; EXCITATION; ION BEAMS; ION SOURCES; MAGNETRONS; MHZ RANGE 01-100; RADIOWAVE RADIATION; SPUTTERING
Descriptors DEC
BEAMS; CHARGED PARTICLES; ELECTROMAGNETIC RADIATION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ENERGY-LEVEL TRANSITIONS; EQUIPMENT; FREQUENCY RANGE; IONS; MHZ RANGE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; RADIATIONS

Optional Information

Notes
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