Published December 2014 | Version v1
Journal article

X-band deflecting cavity design for ultra-short bunch length measurement of SXFEL at SINAP

  • 1. University of Chinese Academy of Sciences, Beijing (China)
  • 2. Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai (China)
  • 3. Department of Engineering Physics, Tsinghua University, Beijing (China)
  • 4. Shanghai Key Laboratory of Cryogenics and Superconducting RF Technology, Shanghai (China)

Description

For developing the X-ray Free Electron Lasers test facility (SXFEL) at Shanghai Institute of Applied Physics, Chinese Academy of Sciences (SINAP), ultra-short bunch is the crucial requirement for excellent lasing performance. It is a big challenge for deflecting cavity to measure the length of ultra-short bunch, and higher deflecting gradient is required for higher measurement resolution. X-band travelling wave deflecting structure has features of higher deflecting voltage and compact structure, which has good performance at ultra-short bunch length measurement. In this paper, a new X-band deflecting structure is designed to operate in HEM11-2π/3 mode. For suppressing the polarization of deflecting plane of the HEM11 mode, two symmetrical caves are added on the cavity wall to separate two polarized modes. (authors)

Additional details

Publishing Information

Journal Title
Nuclear Science and Techniques
Journal Volume
25
Journal Issue
6
Journal Page Range
[6 p.]
ISSN
1001-8042

Optional Information

Notes
8 figs., 4 tabs., 14 refs.; http://dx.doi.org/10.13538/j.1001-8042/nst.25.060101