Published July 1, 2011
| Version v1
Journal article
Effect of Si substrate on ethanol gas sensing properties of ZnO films
Creators
Description
We prepared ZnO/n-Si heterojunctions by depositing ZnO films on n-Si substrates with different resistivities by radio-frequency magnetron sputtering. The microstructure of ZnO film was analyzed by X-ray diffraction and scanning electron microscopy. The current-voltage characteristics and ethanol gas sensing properties of the junctions were investigated at room temperature. It is found that optimization of n-Si substrate resistivity is critical to enhance the ethanol gas sensitivity of ZnO/n-Si heterojunction. The ZnO/n-Si heterojunction with n-Si substrate of 2-3 Ω cm exhibits the best ethanol gas sensing property. The junction shows the sensitivity of 29.41% to 0.24 g/L ethanol gas under + 0.52 V forward bias voltage.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2011.04.009Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2011.04.009;
- PII
- S0040-6090(11)00821-2;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 519
- Journal Issue
- 18
- Journal Page Range
- p. 6151-6154
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43051931
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ELECTRIC POTENTIAL; ETHANOL; HETEROJUNCTIONS; MAGNETRONS; MICROSTRUCTURE; RADIOWAVE RADIATION; SCANNING ELECTRON MICROSCOPY; SENSITIVITY; SENSORS; SPUTTERING; SUBSTRATES; THIN FILMS; X-RAY DIFFRACTION; ZINC OXIDES
- Descriptors DEC
- ALCOHOLS; CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; FILMS; HYDROXY COMPOUNDS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SCATTERING; SEMICONDUCTOR JUNCTIONS; ZINC COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.