Published February 2010
| Version v1
Journal article
Study on the Effect of Base Pressure on Magnetron Sputtering Discharge Plasma by Optical Emission Spectroscopy
Creators
- 1. Plasma Physics Laboratory, Department of Physics, Bharathiar University, Coimbatore 641 046 (India)
Description
Argon plasma was generated by DC magnetron sputtering discharge at a constant input power and sputtering pressure. The emission spectra of the argon plasma, in a region of 300 nm to 800 nm, were recorded with three different base pressures (4x10-4 Pa, 13x10-4 Pa and 26x10-4 Pa). From the spectra, the Boltzmann temperature (TB) was calculated by using the atomic Boltzmann plot method. The intensity ratio of N and N2 lines provided the information on the changes in the degree of dissociation of nitrogen molecules. The obtained results showed that with the increase in base pressure the dissociation of N2 increased and the Boltzmann temperature (TB) decreased.
Availability note (English)
Available from http://dx.doi.org/10.1088/1009-0630/12/1/08Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Science and Technology
- Journal Volume
- 12
- Journal Issue
- 1
- Journal Page Range
- p. 35-40
- ISSN
- 1009-0630
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41078969
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ARGON; DISSOCIATION; ELECTRIC DISCHARGES; EMISSION SPECTRA; EMISSION SPECTROSCOPY; MAGNETRONS; NITROGEN; PLASMA; SPUTTERING
- Descriptors DEC
- ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FLUIDS; GASES; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; RARE GASES; SPECTRA; SPECTROSCOPY