Published 1992 | Version v1
Report

Quick preparation of thin films and characteristics of ablation plasma produced by ion-beam evaporation

  • 1. Nagaoka Univ. of Technology, Niigata (Japan)

Description

An intense, pulsed, light-ion beam (LIB) can be used to produce high density open-quotes ablationclose quotes plasma when the LIB is irradiated on the solid targets. For this case, the LIB can be considered as the effective heat source since the pulse width is short compared to thermal conduction time. Using the above plasma, the authors have succeeded in quick preparation of thin films by open-quotes ion-beam evaporationclose quotes (IBE). Diamond-like carbon films have been successfully prepared on the silicon substrate kept at room temperature by using graphite target. Furthermore, various films were made such as ZnS, ZnS:Mn, B, ITO, YBaCuO, BaTiO3, BN, YSZ, apatite, and so on. The instantaneous deposition rate has been typically estimated on the order of several cm/s. The characteristics of the films prepared have been studied in detail. In connection with the properties of the films studied above, several diagnostics have been carried out on the characteristics of the ablation plasma by time-resolved spectroscopic measurement by using Streak camera, where fully ionized, high-density plasma has been found to be produced

Additional details

Publishing Information

Imprint Title
Beams 92: Proceedings. Volume 3, Microwaves, Free electron lasers, Advanced accelerators, Applications, and Plasma discharges
Imprint Pagination
681 p.
Journal Page Range
p. 1971-1976.
Report number
DOE/ER/54160--1-Vol.3

Conference

Title
9. international conference on high power particle beams.
Dates
25-29 May 1992.
Place
Washington, DC (United States).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
26000459
Subject category
S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BORON; BORON NITRIDES; CARBON; HIGH-TC SUPERCONDUCTORS; ION BEAMS; PHYSICAL RADIATION EFFECTS; PHYSICAL VAPOR DEPOSITION; SPUTTERING; THIN FILMS
Descriptors DEC
BEAMS; BORON COMPOUNDS; DEPOSITION; ELEMENTS; FILMS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; RADIATION EFFECTS; SEMIMETALS; SUPERCONDUCTORS; SURFACE COATING

Optional Information

Secondary number(s)
CONF-920515--Vol.3.