Published January 1983
| Version v1
Journal article
Moessbauer spectroscopy of implanted sources
Creators
- 1. Laboratorium voor Algemene Natuurkunde, Materials Science Centre, Groningen, Netherlands
Description
A review is given of the field of Moessbauer spectroscopy of ion-implanted sources. After an introduction to the various aspects of the ion-implantation method, the following topics are treated: final site selection of implanted impurities; trapping of defects at implanted ions; on-line implantation; implantation in metals, semiconductors and insulators. (Auth.)
Additional details
Publishing Information
- Journal Title
- Hyperfine Interact.
- Journal Volume
- 13
- Journal Issue
- 1-3
- Series
- Hyperfine Interact.
- Journal Page Range
- 65-88
- ISSN
- 0304-3843
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Switzerland
- INIS RN
- 15029347
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BIBLIOGRAPHIES; CRYSTAL DEFECTS; ION IMPLANTATION; ISOMER SHIFT; METALS; MOESSBAUER EFFECT; PHYSICAL RADIATION EFFECTS; REVIEWS; SEMICONDUCTOR MATERIALS; TRAPPING
- Descriptors DEC
- CRYSTAL STRUCTURE; DOCUMENT TYPES; ELEMENTS; MATERIALS; RADIATION EFFECTS
Optional Information
- Notes
- 93 refs.