Published January 2006 | Version v1
Journal article

Effects of ion irradiation on metallic nanocrystals formed by ion beam synthesis in SiO2

  • 1. Department of Electronic Materials Engineering, Research School of Physical Sciences and Engineering, Australian National University, Canberra, ACT 0200 (Australia)

Description

Au nanocrystals (NCs) fabricated by ion implantation into thin SiO2 and annealing were irradiated with 2.3 MeV Sn ions at -180 oC. The NCs were investigated using cross-section transmission electron microscopy (TEM) as a function of irradiation dose. We observe nucleation of new nanocrystals as a consequence of collisional mixing and their growth at the expense of the larger ones upon further irradiation. These observations are consistent with the process of inverse Ostwald ripening, although thermally activated diffusion can be neglected due to the low irradiation temperature. Concomitant with the change in size distribution is a change in NC morphology caused by the anisotropic distribution of recoils during collisions

Additional details

Identifiers

DOI
10.1016/j.nimb.2005.08.065;
PII
S0168-583X(05)01574-0;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
242
Journal Issue
1-2
Journal Page Range
p. 458-460
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
14. international conference on ion beam modification of materials
Dates
5-10 Sep 2004
Place
Pacific Grove, CA (United States)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37068488
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANISOTROPY; ANNEALING; CRYSTAL GROWTH; DISTRIBUTION; ION BEAMS; ION IMPLANTATION; IRRADIATION; MORPHOLOGY; NANOSTRUCTURES; RADIATION DOSES; RIPENING; SILICA; SILICON OXIDES; SYNTHESIS; TIN IONS; TRANSMISSION ELECTRON MICROSCOPY
Descriptors DEC
BEAMS; CHALCOGENIDES; CHARGED PARTICLES; DOSES; ELECTRON MICROSCOPY; HEAT TREATMENTS; IONS; MICROSCOPY; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.