Published January 2006
| Version v1
Journal article
Effects of ion irradiation on metallic nanocrystals formed by ion beam synthesis in SiO2
Creators
- 1. Department of Electronic Materials Engineering, Research School of Physical Sciences and Engineering, Australian National University, Canberra, ACT 0200 (Australia)
Description
Au nanocrystals (NCs) fabricated by ion implantation into thin SiO2 and annealing were irradiated with 2.3 MeV Sn ions at -180 oC. The NCs were investigated using cross-section transmission electron microscopy (TEM) as a function of irradiation dose. We observe nucleation of new nanocrystals as a consequence of collisional mixing and their growth at the expense of the larger ones upon further irradiation. These observations are consistent with the process of inverse Ostwald ripening, although thermally activated diffusion can be neglected due to the low irradiation temperature. Concomitant with the change in size distribution is a change in NC morphology caused by the anisotropic distribution of recoils during collisions
Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2005.08.065;
- PII
- S0168-583X(05)01574-0;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 242
- Journal Issue
- 1-2
- Journal Page Range
- p. 458-460
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 14. international conference on ion beam modification of materials
- Dates
- 5-10 Sep 2004
- Place
- Pacific Grove, CA (United States)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37068488
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANISOTROPY; ANNEALING; CRYSTAL GROWTH; DISTRIBUTION; ION BEAMS; ION IMPLANTATION; IRRADIATION; MORPHOLOGY; NANOSTRUCTURES; RADIATION DOSES; RIPENING; SILICA; SILICON OXIDES; SYNTHESIS; TIN IONS; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CHARGED PARTICLES; DOSES; ELECTRON MICROSCOPY; HEAT TREATMENTS; IONS; MICROSCOPY; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.