Published December 2011 | Version v1
Journal article

Comparison of GaN-Based Light-Emitting Diodes by Using the AlGaN Electron-Blocking Layer and InAlN Electron-Blocking Layer

  • 1. Institute of Opto-Electronic Materials and Technology, South China Normal University, Guangzhou 510631 (China)
  • 2. Experimental Teaching Center, Guangdong University of Technology, Guangzhou 510006 (China)

Description

Optical properties of GaN-based light-emitting diodes (LEDs) are studied numerically by using AlGaN and InAlN electron-blocking layers (EBLs). Through the simulations of emission spectra, carrier concentration distribution, energy band, electrostatic field, internal quantum efficiency and output power, the results show that the LEDs with design of the InAlN EBL structure have a better performance over the original LEDs using an AlGaN EBL. The spectrum intensity and output power are enhanced significantly, and the efficiency droop of internal quantum efficiency is improved effectively with this design of InAlN EBL structure. It is proved that the strengths of carrier confinement and electron leakage current play a critical role in the performance of luminescence in LEDs. (cross-disciplinary physics and related areas of science and technology)

Availability note (English)

Available from http://dx.doi.org/10.1088/0256-307X/28/12/128501

Additional details

Publishing Information

Journal Title
Chinese Physics Letters
Journal Volume
28
Journal Issue
12
Journal Page Range
[4 p.]
ISSN
0256-307X
CODEN
CPLEEU