Published September 1991 | Version v1
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Epataxial growth of the high-temperature superconductors YBa2Cu3O7-x on silicon single crystals with buffer layers

Description

In this work the growth of thin films of the high-temperature superconductor YBa2Cu3O7-x on Si(001) substrates has been investigated by Rutherford backscattering, channeling, X-ray diffraction, high resolution transmission electron microscopy, and electrical measurements. Epitaxial buffer layers of electrically insulating, pure and yttria-stabilized ZrO2 ([Y2O3]0.06[ZrO2]0.94 = YSZ) as well as of metallic CoSi2 were employed to largely prevent the interdiffusion and chemical reaction between the superconductor film and the substrate in spite of the high deposition temperatures of the YBa2Cu3O7-x in the range of 600 to 800deg C. (orig.)

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Additional details

Additional titles

Original title (German)
Epitaktisches Wachstum des Hochtemperatursupraleiters YBA

Publishing Information

Imprint Pagination
83 p.
Report number
Juel--2524