Published October 2009 | Version v1
Journal article

Field localization and enhancement of phase-locked second- and third-order harmonic generation in absorbing semiconductor cavities

  • 1. Charles M. Bowden Research Facility, US Army RDECOM, Redstone Arsenal, Alabama 35803 (United States)
  • 2. Universitat Politecnica de Catalunya, Colom 11, E-08222 Terrassa (Spain)
  • 3. Laboratoire de Photonique et de Nanostructures, Route de Nozay, 91460 Marcoussis (France)

Description

We predict and experimentally observe the enhancement by three orders of magnitude of phase mismatched second and third harmonic generation in a GaAs cavity at 650 and 433 nm, respectively, well above the absorption edge. Phase locking between the pump and the harmonics changes the effective dispersion of the medium and inhibits absorption. Despite hostile conditions the harmonics resonate inside the cavity and become amplified leading to relatively large conversion efficiencies. Field localization thus plays a pivotal role despite the presence of absorption, and ushers in a new class of semiconductor-based devices in the visible and uv ranges.

Additional details

Publishing Information

Journal Title
Physical Review. A
Journal Volume
80
Journal Issue
4
Journal Page Range
p. 043834-043834.6
ISSN
1050-2947
CODEN
PLRAAN

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41060034
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ABSORPTION; CONVERSION; EFFICIENCY; GALLIUM ARSENIDES; HARMONIC GENERATION; HARMONICS; SEMICONDUCTOR MATERIALS
Descriptors DEC
ARSENIC COMPOUNDS; ARSENIDES; FREQUENCY MIXING; GALLIUM COMPOUNDS; MATERIALS; OSCILLATIONS; PNICTIDES; SORPTION

Optional Information

Notes
(c) 2009 The American Physical Society