Published September 7, 2011 | Version v1
Journal article

Damage-free top-down processes for fabricating two-dimensional arrays of 7 nm GaAs nanodiscs using bio-templates and neutral beam etching

  • 1. Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan)
  • 2. Japan Science and Technology Agency, CREST, 5 Sanbancho, Chiyoda, Tokyo 102-0075 (Japan)

Description

The first damage-free top-down fabrication processes for a two-dimensional array of 7 nm GaAs nanodiscs was developed by using ferritin (a protein which includes a 7 nm diameter iron core) bio-templates and neutral beam etching. The photoluminescence of GaAs etched with a neutral beam clearly revealed that the processes could accomplish defect-free etching for GaAs. In the bio-template process, to remove the ferritin protein shell without thermal damage to the GaAs, we firstly developed an oxygen-radical treatment method with a low temperature of 280 deg. C. Then, the neutral beam etched the defect-free nanodisc structure of the GaAs using the iron core as an etching mask. As a result, a two-dimensional array of GaAs quantum dots with a diameter of ∼ 7 nm, a height of ∼ 10 nm, a high taper angle of 88 deg. and a quantum dot density of more than 7 x 1011 cm-2 was successfully fabricated without causing any damage to the GaAs.

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/22/36/365301

Additional details

Identifiers

DOI
10.1088/0957-4484/22/36/365301;
PII
S0957-4484(11)90962-3;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
22
Journal Issue
36
Journal Page Range
[9 p.]
ISSN
0957-4484