Antifungal drugs as corrosion inhibitors for aluminium in 0.1 M HCl
Creators
- 1. Department of Chemistry, Faculty of Science, University of Uyo, Uyo (Nigeria)
- 2. Department of Chemistry, University of Ibadan, Ibadan (Nigeria)
Description
The inhibitive capabilities of Clotrimazole (CTM) and Fluconazole (FLC), two antifungal drugs, on the electrochemical corrosion of aluminium in 0.1 M HCl solution has been studied using weight loss measurements at 30 and 50 deg. C. The results indicate that both compound act as inhibitors in the acidic corrodent. At constant acid concentration, the inhibition efficiency (%I) increased with increase in the concentration of the inhibitors. Increase in temperature increased the corrosion rate in the absence and presence of the inhibitors but decreased the inhibition efficiency. CTM and FLC adsorbed on the surface of aluminium according to the Langmuir adsorption isotherm model at all the concentrations and temperatures studied. Phenomenon of physical adsorption is proposed from the activation parameter obtained. Thermodynamic parameters reveal that the adsorption process is spontaneous. The reactivity of these compounds was analyzed through theoretical calculations based on AM1 semi-empirical method to explain the different efficiencies of these compounds as corrosion inhibitors. CTM was found to be a better inhibitor than FLC.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.corsci.2009.05.017Additional details
Identifiers
- DOI
- 10.1016/j.corsci.2009.05.017;
- PII
- S0010-938X(09)00212-1;
Publishing Information
- Journal Title
- Corrosion Science
- Journal Volume
- 51
- Journal Issue
- 8
- Journal Page Range
- p. 1868-1875
- ISSN
- 0010-938X
- CODEN
- CRRSAA
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41014540
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ADSORPTION; ADSORPTION ISOTHERMS; ALUMINIUM; CORROSION INHIBITORS; CORROSION PROTECTION; DRUGS; ELECTROCHEMICAL CORROSION; HYDROCHLORIC ACID; REACTIVITY; SURFACES
- Descriptors DEC
- CHEMICAL REACTIONS; CHLORINE COMPOUNDS; CORROSION; ELEMENTS; HALOGEN COMPOUNDS; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; ISOTHERMS; METALS; SORPTION
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.