Published August 2009 | Version v1
Journal article

Antifungal drugs as corrosion inhibitors for aluminium in 0.1 M HCl

  • 1. Department of Chemistry, Faculty of Science, University of Uyo, Uyo (Nigeria)
  • 2. Department of Chemistry, University of Ibadan, Ibadan (Nigeria)

Description

The inhibitive capabilities of Clotrimazole (CTM) and Fluconazole (FLC), two antifungal drugs, on the electrochemical corrosion of aluminium in 0.1 M HCl solution has been studied using weight loss measurements at 30 and 50 deg. C. The results indicate that both compound act as inhibitors in the acidic corrodent. At constant acid concentration, the inhibition efficiency (%I) increased with increase in the concentration of the inhibitors. Increase in temperature increased the corrosion rate in the absence and presence of the inhibitors but decreased the inhibition efficiency. CTM and FLC adsorbed on the surface of aluminium according to the Langmuir adsorption isotherm model at all the concentrations and temperatures studied. Phenomenon of physical adsorption is proposed from the activation parameter obtained. Thermodynamic parameters reveal that the adsorption process is spontaneous. The reactivity of these compounds was analyzed through theoretical calculations based on AM1 semi-empirical method to explain the different efficiencies of these compounds as corrosion inhibitors. CTM was found to be a better inhibitor than FLC.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.corsci.2009.05.017

Additional details

Identifiers

DOI
10.1016/j.corsci.2009.05.017;
PII
S0010-938X(09)00212-1;

Publishing Information

Journal Title
Corrosion Science
Journal Volume
51
Journal Issue
8
Journal Page Range
p. 1868-1875
ISSN
0010-938X
CODEN
CRRSAA

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41014540
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ADSORPTION; ADSORPTION ISOTHERMS; ALUMINIUM; CORROSION INHIBITORS; CORROSION PROTECTION; DRUGS; ELECTROCHEMICAL CORROSION; HYDROCHLORIC ACID; REACTIVITY; SURFACES
Descriptors DEC
CHEMICAL REACTIONS; CHLORINE COMPOUNDS; CORROSION; ELEMENTS; HALOGEN COMPOUNDS; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; ISOTHERMS; METALS; SORPTION

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.