Published September 12, 2005
| Version v1
Journal article
Formation of InAs wetting layers studied by cross-sectional scanning tunneling microscopy
- 1. Physikalisch-Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig (Germany)
- 2. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands)
Description
We show that the composition of (segregated) InAs wetting layers (WLs) can be determined by either direct counting of the indium atoms or by analysis of the outward displacement of the cleaved surface as measured by cross-sectional scanning tunneling microscopy. We use this approach to study the effects of the deposited amount of indium, the InAs growth rate, and the host material on the formation of the WLs. We conclude that the formation of (segregated) WLs is a delicate interplay between surface migration, strain-driven segregation, and the dissolution of quantum dots during overgrowth
Additional details
Identifiers
- DOI
- 10.1063/1.2042543;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 87
- Journal Issue
- 11
- Journal Page Range
- p. 111903-111903.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37024109
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ATOMS; CRYSTAL GROWTH; DISSOLUTION; INDIUM; INDIUM ARSENIDES; LAYERS; MIGRATION; MOLECULAR BEAM EPITAXY; QUANTUM DOTS; SCANNING TUNNELING MICROSCOPY; SEGREGATION; SEMICONDUCTOR MATERIALS; STRAINS; SURFACES; THIN FILMS
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CRYSTAL GROWTH METHODS; ELEMENTS; EPITAXY; FILMS; INDIUM COMPOUNDS; MATERIALS; METALS; MICROSCOPY; NANOSTRUCTURES; PNICTIDES
Optional Information
- Notes
- (c) 2005 American Institute of Physics