Published November 3, 2008 | Version v1
Journal article

Formation and dissolution of copper-based nanoparticles in SiO2 sol-gel film using heat treatment and/or UV light exposure

  • 1. School of Materials Science and Engineering, Clemson University, Clemson, SC 29634 (United States)
  • 2. College of Optics, Center for Research and Education in Optics and Lasers (CREOL), University of Central Florida, 4000 Central Florida Boulevard, Orlando, FL 32816 (United States)
  • 3. Nkanea Technologies, Inc., 6440 Aylworth Drive, Frisco, TX 75035 (United States)

Description

We report in this paper, results on the formation and dissolution of Cu-based nanoparticles in sol-gel SiO2 thin films using heat treatment and UV light exposure, respectively. Using UV-vis-NIR spectroscopy, we have shown that Cu2O nanoparticles can be generated by controlling the aging of the sol prior to film deposition while the Cu0 nanoparticles can be synthesized using a heat treatment in H2 atmosphere at 550 deg. C for 6 h. It has been also demonstrated that irradiation with an UV pulsed (Q-switched Nd:YAG) or continuous black ray UV lamp can dissolve these Cu-based nanoparticles with controlled, spatial selectivity. The mechanism of the dissolution process was found to be mainly thermal. Finally, we report a new analytical technique for detecting/confirming the presence of low densities of Cu nanoparticles in the films, based on a relative heat flow measurement of such films using a micro-thermal analyzer (e.g., TA Instruments μTA model 2990)

Availability note (English)

Available from http://dx.doi.org/10.1016/j.materresbull.2007.11.007

Additional details

Identifiers

DOI
10.1016/j.materresbull.2007.11.007;
PII
S0025-5408(07)00509-0;

Publishing Information

Journal Title
Materials Research Bulletin
Journal Volume
43
Journal Issue
11
Journal Page Range
p. 3130-3139
ISSN
0025-5408
CODEN
MRBUAC

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.