Multichannel AlGaN/GaN Schottky barrier diode with low turn-on voltage and on-resistance
Creators
- 1. The School of Microelectronics, Xidian University, Xi'an, 710071 (China)
- 2. Key Lab of Wide Band Gap Semiconductor Materials and Devices, Xi'an, 710071 (China)
Description
Herein, multichannel AlGaN/GaN Schottky barrier diodes (SBDs) with recess structure and tungsten (W) anode are proposed. The multichannel heterostructure improves the current drive capability of the devices and achieves a lower forward voltage (V). W anode reduces the turn-on voltage (V) due to its lower work function and direct contact with all 2D electron gas (2DEG) channels in the recessed area. Post anode annealing is utilized to improve the interface between the metal and GaN etching surface. The fabricated devices with a 6.5 µm anode-cathode distance (L) achieve an ultralow V of 0.29 V, V of 0.69 V, and a low on-resistance (R) of 2.39 Ω mm. The capacitance effect of multichannel heterostructures has been analyzed via the capacitance-voltage characteristics, showing the great potential of multichannel AlGaN/GaN SBDs for high-frequency applications. (© 2022 Wiley‐VCH GmbH)
Availability note (English)
Available from: http://dx.doi.org/10.1002/pssa.202200194Additional details
Identifiers
Publishing Information
- Journal Title
- Physica Status Solidi. A, Applications and Materials Science (Online)
- Journal Volume
- 219
- Journal Issue
- 13
- Journal Page Range
- p. 1-5
- ISSN
- 1862-6319
- CODEN
- PSSABA
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 54030559
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM NITRIDES; ANNEALING; ANODES; CAPACITANCE; CATHODES; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRON GAS; GALLIUM NITRIDES; HETEROJUNCTIONS; SCANNING ELECTRON MICROSCOPY; SCHOTTKY BARRIER DIODES; TUNGSTEN; TWO-DIMENSIONAL SYSTEMS; WORK FUNCTIONS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHEMICAL COATING; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DEPOSITION; ELECTRICAL PROPERTIES; ELECTRODES; ELECTRON MICROSCOPY; ELEMENTS; FUNCTIONS; GALLIUM COMPOUNDS; HEAT TREATMENTS; METALS; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; REFRACTORY METALS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SEMICONDUCTOR JUNCTIONS; SURFACE COATING; TRANSITION ELEMENTS
Optional Information
- Notes
- AID: 2200194