Grain size, texture, and crystallinity in lanthanum monosulfide thin films grown by pulsed laser deposition
- 1. Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson Air Force Base, Ohio 45433 (United States)
- 2. School of Electronics and Computing Systems, University of Cincinnati, Cincinnati, Ohio 45221 (United States)
- 3. Research Institute, University of Dayton, Dayton, OH 45469-0170 (United States)
- 4. Institute for Microstructural Sciences, National Research Council, Ottawa, Ontario, Canada K1A OR6 (Canada)
Description
We report a detailed investigation of the growth of lanthanum monosulfide (LaS) thin films by pulsed laser deposition on (001) magnesium oxide (MgO) substrates in a background of H2S for the purpose of optimizing their crystallinity, texture, and grain size. A variety of films were grown while varying the laser repetition rate, the temperature of the substrate, and the partial pressure of H2S. The thin films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), Raman spectroscopy, and high resolution transmission electron microscopy. Films grown at 500 °C with a H2S background pressure of 3.4 × 10−4 Pa and a laser repetition rate of 8 Hz produced the LaS film with the largest grains whose size averaged 293 nm. The XRD pattern of these films revealed that their orientation was predominantly (200). AFM images of the surface of these films showed large plate-like grains. This contrasts with the fine grain structure observed in LaS films grown at a lower substrate temperature and lower H2S pressure. - Highlights: ► LaS thin films were grown by pulsed laser deposition on MgO substrates in H2S. ► Deposition parameters were substrate temperature, H2S pressure and repetition rate. ► Film crystallinity, texture, and grain size were investigated. ► The growth conditions for optimal texture and grain size are reported.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2012.10.022Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2012.10.022;
- PII
- S0040-6090(12)01291-6;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 524
- Journal Page Range
- p. 166-172
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44103763
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; ENERGY BEAM DEPOSITION; GRAIN SIZE; HYDROGEN SULFIDES; LANTHANUM; LANTHANUM SULFIDES; LASER RADIATION; LASERS; MAGNESIUM OXIDES; OPTIMIZATION; ORIENTATION; PARTIAL PRESSURE; PLATES; PULSED IRRADIATION; RAMAN SPECTROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; CHALCOGENIDES; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELEMENTS; FILMS; HYDROGEN COMPOUNDS; IRRADIATION; LANTHANUM COMPOUNDS; LASER SPECTROSCOPY; MAGNESIUM COMPOUNDS; METALS; MICROSCOPY; MICROSTRUCTURE; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; RARE EARTH COMPOUNDS; RARE EARTHS; SCATTERING; SIZE; SPECTROSCOPY; SULFIDES; SULFUR COMPOUNDS; SURFACE COATING; THERMODYNAMIC PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.