Extracting transport parameters in GaAs nanopillars grown by selective-area epitaxy
Creators
- 1. Department of Electrical Engineering, University of California at Los Angeles, Los Angeles, CA 90095 (United States)
- 2. California Nano-Systems Institute, University of California, Los Angeles, CA 90095 (United States)
Description
We investigate the transport properties in p-type GaAs nanopillars (NPs) grown on GaAs(111) B substrates using selective-area epitaxy by studying single-NP field-effect transistors. Experimental results indicate that normalized resistance and field-effect mobility are highly sensitive to NP dimensions. Both in situ and ex situ chemical surface passivation techniques are found to significantly improve conductivity and mobility, especially for the smaller diameter NPs. A semi-empirical model based on diameter dependent mobility is used to extract actual doping levels and surface state density by fitting normalized resistance as a function of NP diameter. Surface state densities before and after passivation are found to be 5 × 1012 cm−2 eV−1 and 7 × 1010 cm−2 eV−1, respectively. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/23/10/105701Additional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 23
- Journal Issue
- 10
- Journal Page Range
- [5 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43100925
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- EPITAXY; FIELD EFFECT TRANSISTORS; GALLIUM ARSENIDES; NANOSTRUCTURES; PASSIVATION; SURFACES
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CRYSTAL GROWTH METHODS; GALLIUM COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES; TRANSISTORS