Published March 16, 2012 | Version v1
Journal article

Extracting transport parameters in GaAs nanopillars grown by selective-area epitaxy

  • 1. Department of Electrical Engineering, University of California at Los Angeles, Los Angeles, CA 90095 (United States)
  • 2. California Nano-Systems Institute, University of California, Los Angeles, CA 90095 (United States)

Description

We investigate the transport properties in p-type GaAs nanopillars (NPs) grown on GaAs(111) B substrates using selective-area epitaxy by studying single-NP field-effect transistors. Experimental results indicate that normalized resistance and field-effect mobility are highly sensitive to NP dimensions. Both in situ and ex situ chemical surface passivation techniques are found to significantly improve conductivity and mobility, especially for the smaller diameter NPs. A semi-empirical model based on diameter dependent mobility is used to extract actual doping levels and surface state density by fitting normalized resistance as a function of NP diameter. Surface state densities before and after passivation are found to be 5 × 1012 cm−2 eV−1 and 7 × 1010 cm−2 eV−1, respectively. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/23/10/105701

Additional details

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
23
Journal Issue
10
Journal Page Range
[5 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43100925
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
EPITAXY; FIELD EFFECT TRANSISTORS; GALLIUM ARSENIDES; NANOSTRUCTURES; PASSIVATION; SURFACES
Descriptors DEC
ARSENIC COMPOUNDS; ARSENIDES; CRYSTAL GROWTH METHODS; GALLIUM COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES; TRANSISTORS